DOE Multi-line Laser
DOE's 2D diffraction units is formed by micro-nano etching technique. Each diffreaction unit has specific parameter of morphology and refractive index to fine tune the phase distribution of laser wavefront.A laser beam is diffracted after passing through each DOE'S diffraction unit and easily causes interference at a certain propagation distance (typically at infinity or the focal plane of lens) to form a specific light intensity distribution.UPOLabs provides customized DOE products based on customer requirements including complex mode patterns such as 3 lines, 5 lines, 7 lines, 11 lines, 101 lines and pixel arrays.
Wavelength：
All 405nm450nm520nm650nm850nm940nm
Work Distance：
All 50mm100mm200mm250mm300mm400mm500mm600mm700mm800mm900mm1000mm1300mm1500mm1800mm2000mm3000mm4000mm5000mm
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LETO-BL11-48x40-600
450±5nm
400-800mm

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＜700um(@400mm) 

＜220um(@600mm) 

＜1100um(@800mm)

9.4°-40°
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LETO-BL9-60x8-1000
637±5nm
700-1300mm

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＜800um(@700mm) 

＜550um(@1000mm) 

＜1250um(@1300mm)

9.4°-40°
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LETO-BL7-22.5x55-450
450±5nm
45-55mm

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≤100um(@45mm) 

≤45um(@50mm) 

113um(@55mm)

9.4°-40°
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Model

Wavelength

Work Distance

Line Width(1/e^2)

Depth of Field

Linewidth Angle (FA)

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